Monitoring of ion implantation in Si with carrier plasma waves using infrared photothermal radiometry

Applied Physics Letters

Volumn 71, Issue 11, 1997, Pages 1531-1533

  Salnick, A ^a   Mandelis, A ^a   Funak, F ^a   Jean, C ^a,b  

^a UNIVERSITY OF TORONTO   (Canada)

^b Mitel Networks Corporation   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0013329794     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.119957     Document Type: Article

References (19)

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