Photosensitive resists for optical lithography

Comptes Rendus Physique

Volumn 7, Issue 8, 2006, Pages 924-930

  Mortini, Bénédicte ^a  

^a STMICROELECTRONICS   (France)

Author keywords

Chemically Amplified Resist; Immersion lithography; Post exposure bake

Indexed keywords

EID: 33751511482     PISSN: 16310705     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.crhy.2006.10.010     Document Type: Short Survey

References (5)

1. Ito H., et al. Polym. Eng. Sci. 23 (1982) 1021
2. E.C. Pisani, EMCR-721 microlithography materials, Feb. 2005
3. Hinsberg W., et al. Proc. SPIE 5376 (2004) 21-33
4. Ando T., et al. Proc. SPIE 6153 (2006) 615309
5. Chang C., et al. Proc. SPIE 6154 (2006) 615417