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Volumn 2005, Issue , 2005, Pages 293-296

A semiempirical surface scattering model for quantum corrected Monte Carlo simulation of strained Si-nMOSFETs

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRON MOBILITY; INTEGRATION; MATHEMATICAL MODELS; MONTE CARLO METHODS; QUANTUM THEORY;

EID: 33751425381     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ESSDER.2005.1546643     Document Type: Conference Paper
Times cited : (4)

References (13)
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  • 3
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    • Carrier mobilities and process stability of strained Si n- and p-MOSFETs on SiGe virtual substrates
    • M. T. Currie, C. W. Leitz, T. A. Langdo, G. Taraschi, and E. A. Fitzgerald, "Carrier mobilities and process stability of strained Si n- and p-MOSFETs on SiGe virtual substrates," J. Vac. Sci. Technol. B, vol. 19, no. 6, pp. 2268-2279, 2001.
    • (2001) J. Vac. Sci. Technol. B , vol.19 , Issue.6 , pp. 2268-2279
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  • 6
    • 0038104343 scopus 로고    scopus 로고
    • Influence of high channel doping on the inversion layer electron mobility in strained silicon n-MOSFETs
    • H. Nayfeh, C. Leitz, A. Pitera, E. Fitzgerald, J. Hoyt, and D. Antoniadis, "Influence of high channel doping on the inversion layer electron mobility in strained silicon n-MOSFETs," IEEE Electron Device Lett., vol. 24, no. 4, pp. 248-250, 2003.
    • (2003) IEEE Electron Device Lett. , vol.24 , Issue.4 , pp. 248-250
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  • 9
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    • Study of 50-nm nMOSFET by ensemble Monte Carlo simulation including a new approach to surface roughness and impurity scattering in the si inversion layer
    • G. Formicone, M. Saraniti, D. Vasileska, and D. Ferry, "Study of 50-nm nMOSFET by ensemble Monte Carlo simulation including a new approach to surface roughness and impurity scattering in the si inversion layer," IEEE Trans. Electron Devices, vol. 49, no. 1, pp. 125-132, 2002.
    • (2002) IEEE Trans. Electron Devices , vol.49 , Issue.1 , pp. 125-132
    • Formicone, G.1    Saraniti, M.2    Vasileska, D.3    Ferry, D.4
  • 10
    • 0038056340 scopus 로고    scopus 로고
    • A quantum correction based on Schrödinger equation applied to Monte Carlo device simulation
    • B. Winstead and U. Ravaioli, "A quantum correction based on Schrödinger equation applied to Monte Carlo device simulation," IEEE Trans. Electron Devices, vol. 50, no. 2, pp. 440-446, 2003.
    • (2003) IEEE Trans. Electron Devices , vol.50 , Issue.2 , pp. 440-446
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  • 11
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    • On the enhanced electron mobility in strained-silicon inversion layers
    • M. Fischetti, F. Gámiz, and W. Hänsen, "On the enhanced electron mobility in strained-silicon inversion layers," J. Appl. Phys., vol. 92, no. 12, pp. 7320-7324, 2002.
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    • H. Shin, G. M. Yeric, A. F. Tasch, and C. M. Maziar, "Physically- based models for effective mobility and local-field mobility of electrons in MOS inversion layers," Solid-State Electron., vol. 34, pp. 545-552, 1991.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.