Role of temperature and gas-chemistry in micro-masking of InP by ICP etching

Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS

Volumn 2005, Issue , 2005, Pages 987-988

  Karouta, F ^a   Docter, B ^a   Geluk, E J ^a   Sander Jochem, M J H ^a   Van Der Tol, J J G M ^a   Smit, M K ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33751308643     PISSN: 10928081     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/LEOS.2005.1548344     Document Type: Conference Paper

References (4)

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2. A. Matsutani, H. Ohtsuki, S. Muta, F. Koyama, K. Iga, Jpn. J. Appl. Phys. Vol. 40, 2001, pp. 1528-1529.
3. th IPRM04, May 31-June 4, Kagoshima, Japan. Proceedings ISBN 0-7803-8595-0, PP. 322-325.
4. E.W. Sabin, J.Vac. Sci. Technol. B 16(4), Jul/Aug 1998, pp. 1841-1845.