Influence of ICP etching on surface morphology of InP substrates

Conference Proceedings - International Conference on Indium Phosphide and Related Materials

Volumn , Issue , 2004, Pages 322-325

  Karouta, F ^a   Geluk, E J ^a   Van Der Heijden, R W ^a   Silov, A Yu ^a   Eijkemans, T ^a   Van Der Toi, J J G M ^a   Smit, M K ^a   Salemink, H W M ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYTIC GROWTH; GAS FLOWS; NANOCRYSTALS; REACTION PRODUCTS;

CATALYSIS; CHEMICAL BONDS; ETCHING; INDUCTIVELY COUPLED PLASMA; MORPHOLOGY; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SUBSTRATES; SURFACES;

SEMICONDUCTING INDIUM PHOSPHIDE;

EID: 23744432553     PISSN: 10928669     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICIPRM.2004.1442720     Document Type: Conference Paper

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