Ferroelectric thin films for applications in high frequency range

Ferroelectrics

Volumn 316, Issue , 2005, Pages 7-12

  Rousseau, A ^a   Guilloux Viry, M ^a   Bouquet, V ^a   Perrin, A ^a   Tanne G ^b   Huret, F ^b   Seaux, J F ^c   Cros, D ^c   Madrangeas, V ^c  

^a UNIVERSITÉ DE RENNES 1   (France)

^b CNRS   (France)

^c Centre National de la Recherche Scientifique   (France)

Author keywords

Ferroelectric; Microwaves; Pulsed laser deposition; Thin films

Indexed keywords

CAPACITORS; CRYSTAL ORIENTATION; DIELECTRIC PROPERTIES; EPITAXIAL GROWTH; MICROSTRUCTURE; MICROWAVES; PULSED LASER DEPOSITION; SINTERED ALUMINA; SUBSTRATES;

EPITAXIAL FILMS; LOSSES MEASUREMENTS; ORIENTED FILMS; STRUCTURAL CHARACTERISTICS;

FERROELECTRIC THIN FILMS;

EID: 33751304950     PISSN: 00150193     EISSN: 15635112     Source Type: Conference Proceeding    
DOI: 10.1080/00150190590963075     Document Type: Article

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