Characteristics of low temperature PECVD silicon nitride for MEMS structural materials

International Journal of Modern Physics B

Volumn 20, Issue 25-27, 2006, Pages 3799-3804

  Huang, H ^a   Suvorova, A ^b   Winchester, K J ^b   Dell, J M ^b   Faraone, L ^b  

^a UNIVERSITY OF QUEENSLAND   (Australia)

^b UNIVERSITY OF WESTERN AUSTRALIA   (Australia)

Author keywords

Low temperature; Mechanical property; Microstructure; PECVD; Silicon nitride

Indexed keywords

EID: 33751268210     PISSN: 02179792     EISSN: None     Source Type: Journal    
DOI: 10.1142/s0217979206040398     Document Type: Conference Paper

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