Investigation of processing parameters for pulsed closed-field unbalanced magnetron co-sputtered TiC-C thin films

Surface and Coatings Technology

Volumn 201, Issue 7 SPEC. ISS., 2006, Pages 4131-4135

  Anton, J M ^a   Mishra, B ^a   Moore, J J ^a   Rees, J A ^b   Sproul, W D ^c  

^a Department of Geology and Geological Engineering   (United States)

^b HIDEN ANALYTICAL LTD   (United Kingdom)

^c Reactive Sputtering Consulting LLC   (United States)

Author keywords

Ion energy; Nanocomposites; Pulsed DC magnetron sputtering; TiC

Indexed keywords

ION BOMBARDMENT; MAGNETRON SPUTTERING; PLASMA DEVICES; TRIBOLOGY; WEAR RESISTANCE;

ELECTROSTATIC QUADRUPOLE PLASMA ANALYZER; ION ENERGY; PULSED DIRECT CURRENT MAGNETRON SPUTTERING;

TITANIUM CARBIDE;

ION BOMBARDMENT; MAGNETRON SPUTTERING; PLASMA DEVICES; TITANIUM CARBIDE; TRIBOLOGY; WEAR RESISTANCE;

EID: 33751249318     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.08.015     Document Type: Article

References (16)

1. Vepřek S. Thin Solid Films 317 (1998) 449
2. Vepřek S. J. Vac. Sci. Technol., A, Vac. Surf. Films 17 5 (1999) 2401
3. Zehnder T., and Patscheider J. Surf. Coat. Technol 133-134 (2000) 138
4. Thornton J.A. J. Vac. Sci. Technol. 11 4 (1974) 666
5. Messier R., Giri A.P., and Roy R.A. J. Vac. Sci. Technol., A, Vac. Surf. Films 2 2 (1984) 500
6. Kelly P.J., and Arnell R.D. J. Vac. Sci. Technol., A, Vac. Surf. Films 16 5 (1998) 2858
7. Smith D.L. Thin-Film Deposition: Principles and Practice (1995), McGraw Hill, Inc., New York 372
8. Schiller S., Goedicke K., Reschke J., Kirchhoff V., Schneider S., and Milde F. Surf. Coat. Technol. 61 (1993) 331
9. Kelly P.J., Abu-Zeid O.A., Arnell R.D., and Tong J. Surf. Coat. Technol. 86-87 (1996) 28
10. Bradley J.W., Backer H., Kelly P.J., and Arnell R.D. Surf. Coat. Technol. 135 (2001) 221
11. Bradley J.W., Backer H., Kelly P.J., and Arnell R.D. Surf. Coat. Technol. 142-144 (2001) 337
12. Muratore C., Moore J.J., and Rees J.A. Surf. Coat. Technol. 163-164 (2003) 12
13. Petrov I., Adibi F., Greene J.E., Hultman L., and Sundgren J.-E. Appl. Phys. Lett. 63 1 (1993) 36
14. Voevodin A.A., Jones J.G., and Zabinski J.S. J. Vac. Sci. Technol., A, Vac. Surf. Films 19 4 (2001) 1320
15. Chapman B. Glow Discharge Processes (1980), John Wiley & Sons, Inc., New York 29
16. Petrov I., Barna P.B., Hultman L., and Greene J.E. J. Vac. Sci. Technol., A, Vac. Surf. Films 21 5 (2003) S117