Enhanced performance of HFCVD nanocrystalline diamond self-mated tribosystems by plasma pretreatments on silicon nitride substrates

Diamond and Related Materials

Volumn 15, Issue 11-12 SPEC. ISS., 2006, Pages 2024-2028

  Abreu, C S ^a   Amaral, M ^b   Oliveira, F J ^b   Fernandes, A J S ^c   Gomes, J R ^d   Silva, R F ^b  

^a INSTITUTO SUPERIOR DE ENGENHARIA DO PORTO   (Portugal)

^b UNIVERSITY OF AVEIRO   (Portugal)

^c UNIVERSITY OF AVEIRO   (Portugal)

^d UNIVERSITY OF MINHO   (Portugal)

Author keywords

Diamond film; Hot filament CVD; Nanocrystalline; Tribology

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; PLASMAS; SILICON NITRIDE; SURFACE ROUGHNESS; TRIBOLOGY;

FILM ADHESION; HOT FILAMENT CHEMICAL VAPOR DEPOSITION (HFCVD); HYDROGEN ETCHING; NANOCRYSTALLINE DIAMOND (NCD) COATINGS;

NANOSTRUCTURED MATERIALS;

EID: 33751180784     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2006.07.025     Document Type: Article

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