Internal friction studies of nanocomposite superhard nc-TiN/a-Si3N4 and nc-(Ti1-xAlx)N/a-Si3N4 films

Materials Science and Engineering: A

Volumn 442, Issue 1-2 SPEC. ISS., 2006, Pages 328-331

  Fang, Q F ^a   Liu, Q ^a   Li, S Z ^b   Li, Z S ^a   Karvankova, P ^c   Jilek, M ^d   Veprek, S ^c  

^a INSTITUTE OF SOLID STATE PHYSICS   (China)

^b QINGDAO UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^c TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^d SHM Ltd   (Czech Republic)

Author keywords

Internal friction; Nanocomposite; Silicon nitride; Thin films; Titanium nitride; Young's modulus

Indexed keywords

ACTIVATION ENERGY; ANNEALING; ELASTIC MODULI; ELASTICITY; HARDNESS; INTERNAL FRICTION; MAGNETRON SPUTTERING; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RELAXATION PROCESSES; SILICON NITRIDE; TEMPERATURE; TITANIUM NITRIDE;

ANELASTIC PROPERTIES; ELASTIC PROPERTIES; MECHANICAL SPECTROSCOPY; SUPERHARD NANOCOMPOSITE FILMS; VACUUM ARC DEPOSITION;

NANOSTRUCTURED MATERIALS;

ACTIVATION ENERGY; ANNEALING; ELASTIC MODULI; ELASTICITY; HARDNESS; INTERNAL FRICTION; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RELAXATION PROCESSES; SILICON NITRIDE; TEMPERATURE; TITANIUM NITRIDE;

EID: 33751096215     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.msea.2006.01.150     Document Type: Article

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