Comparison of plasma densities measured by using electrical probes to those measured by using microwave probes in inductively coupled plasmas

Journal of the Korean Physical Society

Volumn 49, Issue 4, 2006, Pages 1687-1690

  Kim, Won Ki ^a   Lee, Min Hyong ^a   Chung, Chin Wook ^a   Kim, Jung Hyung ^b  

^a Hanyang University   (South Korea)

^b Korea Research Institute of Standards and Science   (South Korea)

Author keywords

Electrical probe; Microwave probe; Plasma density

Indexed keywords

EID: 33751066806     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (11)

1. Alfred Grill, Cold Plasma in Material Fabrication : from Fundamentals to Applications Processing from Fundamentals (IEEE Press, New York, 1994).
2. Roth, J. Reece, Industrial Plasma Engineering. Vol. 2, Applications to Nonthermal Plasma Processing (Institute of Physics Pub, Bristol, 2001).
3. M. A Liebermann and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994).
4. J. H. Kim, D. J. Seong, J. Y. Kim and K. H. Chung, Appl. Phys. Lett. 83, 4725 (2003).
5. R. B. Piejak, V. A. Godyak, R. Garner and B. M. Alexandrovich, J. Appl. Phys. 95, 3785 (2004).
6. R. L. Stenzel, Rev. Sci. Instrum. 47, 603 (1976).
7. H. Kokura, K. Nakamura, I. P. Ghanashev and H. Sugai, Jpn. J. Appl. Phys. 38, 5262 (1999).
8. I. G. Kondrat'ev, A. V. Kostrov, A. I. Smirnov, A. V. Strikkovskii and A. V. Shashurin, Plasma Phys. Rep. 28, 900 (2001).
9. V. A. Godyak, R. B. Piejak and B. M. Alexandrovich, Plasma Sources Sci. Technol. 1, 36 (1992).
10. J. H. Kim, Y. H. Shin, K. W. Chung and S. C. Choi, Sae Mulli 47, 415 (2003).
11. J. H. Kim, S. C. Choi, Y. H. Shin and K. W. Chung, Rev. Sci. Instrum. 75, 2706 (2004).