Preparation of c-axis-oriented Bi4Ti3O12 thick films by templated grain growth

Journal of the European Ceramic Society

Volumn 27, Issue 2-3, 2007, Pages 663-667

  Xiang, Ping Hua ^a   Kinemuchi, Yoshiaki ^a   Watari, Koji ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Bismuth titanate; Dielectric properties; Microstructure

Indexed keywords

BISMUTH TITANATE; TEMPLATED GRAIN GROWTH;

CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; DIELECTRIC LOSSES; GRAIN GROWTH; PERMITTIVITY; SCANNING ELECTRON MICROSCOPY; SINTERING; THICK FILMS; X RAY DIFFRACTION ANALYSIS;

BISMUTH COMPOUNDS;

BISMUTH COMPOUNDS; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; DIELECTRIC LOSSES; GRAIN GROWTH; PERMITTIVITY; SCANNING ELECTRON MICROSCOPY; SINTERING; THICK FILMS; X RAY DIFFRACTION ANALYSIS;

EID: 33750990748     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jeurceramsoc.2006.04.047     Document Type: Article

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