Sensitivity to humidity of TiO2 thin films obtained by reactive magnetron sputtering

Surface and Coatings Technology

Volumn 201, Issue 6, 2006, Pages 2226-2229

  Radeva, E I ^a   Martev, I N ^b   Dechev, D A ^b,c   Ivanov, N ^b,c   Tsaneva, V N ^d   Barber, Z H ^d  

^a INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

^b INSTITUTE OF ELECTRONICS   (Bulgaria)

^c TECHNICAL UNIVERSITY OF SOFIA   (Bulgaria)

^d UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

Auger Electron Spectroscopy; Humidity sensors; Plasma polymerization; Thin films; Titanium dioxide; X ray diffraction

Indexed keywords

ATMOSPHERIC HUMIDITY; AUGER ELECTRON SPECTROSCOPY; CHARACTERIZATION; CRYSTAL RESONATORS; DEPOSITION; PLASMA POLYMERIZATION; THIN FILMS; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS;

HUMIDITY SENSORS; QUARTZ MICROBALANCE; QUARTZ RESONATOR; REACTIVE MAGNETRON SPUTTERING;

MAGNETRON SPUTTERING;

ATMOSPHERIC HUMIDITY; AUGER ELECTRON SPECTROSCOPY; CHARACTERIZATION; CRYSTAL RESONATORS; DEPOSITION; MAGNETRON SPUTTERING; PLASMA POLYMERIZATION; THIN FILMS; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS;

EID: 33750983922     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.03.027     Document Type: Article

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