Hydrophilic characteristics of rf-sputtered amorphous TiO2 film

Vacuum

Volumn 59, Issue 2-3, 2000, Pages 506-513

  Nakamura, M ^a   Aoki, T ^a   Hatanaka, Y ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001134473     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(00)00309-2     Document Type: Article

References (14)

1. Negishi N, Iyoda T, Hashimoto K, Fujishima A. Chem Lett 1995; 841.
2. Ohko Y, Fujishima A. J Phys Chem B 1998;102:1724.
3. Ohko Y, Tryk DA, Hashimoto K, Fujishima A. J Phys Chem B 1998;102:2699.
4. Ichikawa S, Doi R. Catal Today 1996;27:271.
5. Tada H, Tanaka M. Langmuir 1997;13:360.
6. Anderson C, Bard AJ. J Phys Chem B 1997;101:2611.
7. Takeuchi K, Murasawa S, Ibusuki T. In: Shimura S, editor. "Hikarishokubai no sekai (Japanese)", Kogyochosakai, Japan, 1998. (Chapter 1).
8. Matthews RW. J Phys Chem 1987;91:3328.
9. Ibusuki T, Takeuchi K. J Mol Catal 1994;88:93.
10. Hashimoto K, Fujishima A. Catalysts Catal 1994;36:524.
11. Jaeger Clvin D, Bard Allen J. J Phys Chem 1979;83:3146.
12. Wang R, Hashimoto K, Fujishima A, Chikuni M, Kojima E, Kitamura A, Shimohigoshi M, Watanabe T. Nature 1997;388:431.
13. Hashimoto K, Watanabe T. J Surf Sci Soc Jpn 1999;20:85.
14. Iida T, Nozaki H. J Chem Soc Jpn, Ind Chem Sec 1967;70:1285.