Microstructural differences in thin film Zn Ga 2O 4: Mn phosphor produced by differences in sputtering gas pressure

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 6, 2006, Pages 2164-2171

  Kim, Joo Han ^a   Holloway, Paul H ^b,c  

^a Chungbuk National University   (South Korea)

^b J Crayton Pruitt Family Department of Biomedical Engineering   (United States)

^c UNIVERSITY OF FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADATOM MOBILITY; ENERGETIC PARTICLE BOMBARDMENT; FILM DENSITY; X-RAY REFLECTIVITY;

ATOMIC FORCE MICROSCOPY; FILM GROWTH; ION BOMBARDMENT; MAGNETRON SPUTTERING; MICROSTRUCTURE; POROSITY; THIN FILMS;

PHOSPHORS;

EID: 33750946776     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2359737     Document Type: Article

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