Effect of crystal orientation on imaging contrast and sputter results during focused ion beam milling of Cu studied by FIB, EBSD, SEM, and AFM

Microscopy and Microanalysis

Volumn 12, Issue SUPPL. 2, 2006, Pages 1302-1303

  Wendt, U ^a   Nolze, G ^b   Heyse, H ^a  

^a OTTO VON GUERICKE UNIVERSITY   (Germany)

^b BAM FEDERAL INSTITUTE FOR MATERIALS RESEARCH AND TESTING   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33750846906     PISSN: 14319276     EISSN: 14358115     Source Type: Journal    
DOI: 10.1017/S1431927606061812     Document Type: Conference Paper

References (3)

1. Y. Yahiro et al., J. Electron Microsc., 53 (2004) 571.
2. B.W. Kempshall et al., J.Vac.Sci.Technol., B 19 (2001) 749.
3. E.E. Underwood, Acta stereol., 10 (1991) 149.