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Volumn 515, Issue 4, 2006, Pages 2257-2261

The effect of elastic modulus on channel crack propagation in organosilicate glass films

Author keywords

Cracks; Dielectric films; Elastic properties; Fracture; Low k; Organosilicate

Indexed keywords

CRACKS; DIELECTRIC MATERIALS; ELASTIC MODULI; FRACTURE; FRACTURE MECHANICS; PERMITTIVITY; SILICA; THIN FILMS;

EID: 33750843729     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.06.022     Document Type: Article
Times cited : (9)

References (13)
  • 13
    • 8644272510 scopus 로고    scopus 로고
    • A. Grill, D. Edelstein, D. Restaino, M. Lane, S. Gates, E. Liniger, T. Shaw, X-H. Liu, D. Klaus, V. Patel, S. Cohen, E. Simonyi, N. Klymko, S. Lane, K. Ida, S. Vogt, T. Van Kleeck, C. Davis, M. Ono, T. Nogami, T. Ivers, "Optimization of SiCOH Dielectrics for Integration in a 90 nm CMOS Technology", Burlingame, CA, U.S.A., June 7-9, 2004, IEEE Electron Devices Society, International Interconnect Technology Conference Proceedings (2004), 54.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.