Effects of the electric field on the crystallization behaviors in field-aided lateral crystallization process

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 2507-2512

  Wang, Yuhang ^a   Wang, Langping ^a   Tang, Baoyin ^a   Choi, Duck Kyun ^b  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

^b Hanyang University   (South Korea)

Author keywords

Electromigration; Field aided lateral crystallization; Metal induced lateral crystallization

Indexed keywords

CRYSTALLIZATION; CURRENT DENSITY; ELECTROMIGRATION; RAMAN SCATTERING;

CRYSTALLIZATION BEHAVIOR; FIELD AIDED LATERAL CRYSTALLIZATION; METAL INDUCED LATERAL CRYSTALLIZATION;

ELECTRIC FIELD EFFECTS;

EID: 33750828108     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.07.095     Document Type: Article

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