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Volumn 39, Issue 11, 2000, Pages 6191-6195

Influence of Cu and Au on field aided lateral crystallization of amorphous silicon films

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; COPPER; CRYSTALLIZATION; ELECTRIC FIELD EFFECTS; ELECTRODES; GOLD; LOW TEMPERATURE EFFECTS;

FIELD AIDED LATERAL CRYSTALLIZATION (FALC) TECHNIQUES;

AMORPHOUS FILMS;

EID: 0034314721 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.39.6191 Document Type: Article

Times cited : (21)

References (16)

1
- 33645845528
- N. Bhat, M. Cao and K. C. Saraswat: SID'95 Dig., p. 393.
- SID'95 Dig. , pp. 393
- Bhat, N.¹ Cao, M.² Saraswat, K.C.³

2
- 11644268068
- Y. Kawazu, H. Kudo, S. Onari and T. Arai: Jpn. J. Appl. Phys. 29 (1990) 2698.
- (1990) Jpn. J. Appl. Phys. , vol.29 , pp. 2698
- Kawazu, Y.¹ Kudo, H.² Onari, S.³ Arai, T.⁴

3
- 0007918536
- eds. K. N. Tu and J. W. Mayer John Wiley & Son, New York, Chap. 10
- K. N. Tu and J. W. Mayer: Thin Films-Interdiffusion and Reactions, eds. K. N. Tu and J. W. Mayer (John Wiley & Son, New York, 1978) Chap. 10, p. 368.
- (1978) Thin Films-Interdiffusion and Reactions , pp. 368
- Tu, K.N.¹ Mayer, J.W.²

4
- 36449007964
- C. Hayzelden, J. L. Batstone and R. C Cammarata: Appl. Phys. Lett. 60 (1992) 225.
- (1992) Appl. Phys. Lett. , vol.60 , pp. 225
- Hayzelden, C.¹ Batstone, J.L.² Cammarata, R.C.³

5
- 0030128485
- S.-W. Lee and S.-K. Joo: IEEE Electron Device Lett. 17 (1996) 160.
- (1996) IEEE Electron Device Lett. , vol.17 , pp. 160
- Lee, S.-W.¹ Joo, S.-K.²

6
- 0033076362
- S.-H. Park, S.-I. Jun, K.-S. Song, C.-K. Kim and D.-K. Choi: Jpn. J. Appl. Phys. 38 (1999) L108.
- (1999) Jpn. J. Appl. Phys. , vol.38
- Park, S.-H.¹ Jun, S.-I.² Song, K.-S.³ Kim, C.-K.⁴ Choi, D.-K.⁵

7
- 0032635627
- K.-S. Song, J.-B. Lee, S.-I. Jun, D.-K. Choi and S.-G. Park: J. Mater. Sci. Lett. 18 (1999) 1209.
- (1999) J. Mater. Sci. Lett. , vol.18 , pp. 1209
- Song, K.-S.¹ Lee, J.-B.² Jun, S.-I.³ Choi, D.-K.⁴ Park, S.-G.⁵

8
- 0001275765
- S. W. Russel, J. Li and J. W. Mayer: J. Appl. Phys. 70 (1991) 5153.
- (1991) J. Appl. Phys. , vol.70 , pp. 5153
- Russel, S.W.¹ Li, J.² Mayer, J.W.³

9
- 36549100673
- L. Hultman, A. Robertsson, H. T. G. Hentzell, I. Engstrom and P. A. Psaras: J. Appl. Phys. 62 (1987) 3647.
- (1987) J. Appl. Phys. , vol.62 , pp. 3647
- Hultman, L.¹ Robertsson, A.² Hentzell, H.T.G.³ Engstrom, I.⁴ Psaras, P.A.⁵

10
- 2042462514
- R. G. Elliman, J. M. Gibson, D. C. Jacobson, J. M. Poate and J. S. Williams: Appl. Phys. Leu. 46 (1985) 478.
- (1985) Appl. Phys. Leu. , vol.46 , pp. 478
- Elliman, R.G.¹ Gibson, J.M.² Jacobson, D.C.³ Poate, J.M.⁴ Williams, J.S.⁵

11
- 0025471333
- L. Stolt and F. M. D'Heurle: Thin Solid Film 189 (1990) 269.
- (1990) Thin Solid Film , vol.189 , pp. 269
- Stolt, L.¹ D'Heurle, F.M.²

12
- 0002190489
- L. S. Hung, J. W. Mayer, C. S. Pai and S. S. Law: J. Appl. Phys. 58 (1985) 1527.
- (1985) J. Appl. Phys. , vol.58 , pp. 1527
- Hung, L.S.¹ Mayer, J.W.² Pai, C.S.³ Law, S.S.⁴

13
- 0342748599
- C. M. Comrie and J. M. Egan: J. Appl. Phys. 64 (1988) 1173.
- (1988) J. Appl. Phys. , vol.64 , pp. 1173
- Comrie, C.M.¹ Egan, J.M.²

14
- 36449009173
- S.-W. Lee, Y.-C. Jeon and S.-K. Joo: Appl. Phys. Lett. 66 (1995) 1671.
- (1995) Appl. Phys. Lett. , vol.66 , pp. 1671
- Lee, S.-W.¹ Jeon, Y.-C.² Joo, S.-K.³

15
- 0031250492
- D.-K. Sohn, S.-C. Park, S.-W. Kang and B.-T. Ahn: J. Electrochem. Soc. 144 (1997) 3592.
- (1997) J. Electrochem. Soc. , vol.144 , pp. 3592
- Sohn, D.-K.¹ Park, S.-C.² Kang, S.-W.³ Ahn, B.-T.⁴

16
- 0016943152
- A. K. Green and E. Bauer: J. Appl. Phys. 47 (1976) 1284.
- (1976) J. Appl. Phys. , vol.47 , pp. 1284
- Green, A.K.¹ Bauer, E.²

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