The large modification of phase transition characteristics of VO2 films on SiO2/Si substrates

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 1275-1279

  Yuan, Ningyi ^a   Li, Jinhua ^a   Li, Ge ^a   Chen, Xiaoshuang ^b  

^a CHANGZHOU UNIVERSITY   (China)

^b SHANGHAI INSTITUTE OF TECHNICAL PHYSICS   (China)

Author keywords

Ion beam enhanced deposition (IBED); Ion implantation; Phase transition; Vanadium oxide

Indexed keywords

DIFFRACTION; ION IMPLANTATION; PHASE TRANSITIONS; VANADIUM COMPOUNDS; X RAY DIFFRACTION;

ANNEALING TEMPERATURE; ARGON ATOMS; RESISTANCE CHANGE;

THIN FILMS;

EID: 33750799094     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.03.015     Document Type: Article

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