Physico-chemical and electrical properties of rapid thermal oxides on Ge-rich SiGe heterolayers

Applied Surface Science

Volumn 253, Issue 3, 2006, Pages 1323-1329

  Das, R ^a   Bera, M K ^a   Chakraborty, S ^a   Saha, S ^b   Woitok, J F ^c   Maiti, C K ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY   (India)

^b VIDYASAGAR UNIVERSITY   (India)

^c MALVERN INSTRUMENTS LTD   (United Kingdom)

Author keywords

Ge segregation; Ge rich SiGe; Mixed oxide; Rapid thermal oxidation

Indexed keywords

ELECTRIC PROPERTIES; GERMANIUM COMPOUNDS; INTERFACES (MATERIALS); OXIDATION; SEGREGATION (METALLOGRAPHY); STRAIN; X RAY DIFFRACTION;

GE SEGREGATION; GE-RICH SIGE; MIXED OXIDE; RAPID THERMAL OXIDATION; THERMAL OXIDES;

SILICON COMPOUNDS;

EID: 33750744075     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.02.004     Document Type: Article

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