New MOCVD precursor for iridium thin films deposition

Materials Letters

Volumn 61, Issue 1, 2007, Pages 216-218

  Yan, Xin ^a   Zhang, Qiuyu ^a   Fan, Xiaodong ^a  

^a NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

Author keywords

Iridium; MOCVD; Precursor; Thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; FILM GROWTH; INFRARED SPECTROSCOPY; IRIDIUM; METALLORGANIC CHEMICAL VAPOR DEPOSITION; X RAY DIFFRACTION;

Β-DIKETONATE GROUP; ACETYLACETONATE; PRECURSORS;

THIN FILMS;

EID: 33750618242     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2006.04.034     Document Type: Article

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