SCOPUS 정보 검색 플랫폼

Volumn 16, Issue 11, 2006, Pages 2287-2291

Dry etching of deep cavities in Pyrex for MEMS applications using standard lithography

Author keywords

[No Author keywords available]

Indexed keywords

DESIGN FOR TESTABILITY; DRY ETCHING; LITHOGRAPHY; MICROELECTROMECHANICAL DEVICES; OPTIMIZATION; REACTIVE ION ETCHING;

DEEP CAVITIES; ETCH RATE; PYREX; SILICON ETCH;

BOROSILICATE GLASS;

EID: 33750588531 PISSN: 09601317 EISSN: 13616439 Source Type: Journal
DOI: 10.1088/0960-1317/16/11/006 Document Type: Article

Times cited : (30)

References (13)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.