Resistive switching in Pt/Al2O3/TiO2/Ru stacked structures

Electrochemical and Solid-State Letters

Volumn 9, Issue 12, 2006, Pages 343-346

  Kim, Kyung Min ^a   Choi, Byung Joon ^a   Koo, Bon Wook ^a   Choi, Seol ^a   Jeong, Doo Seok ^a,b   Hwang, Cheol Seong ^a  

^a Seoul National University   (South Korea)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRONS; HEAT CONDUCTION; NUCLEATION; POLARIMETERS; PULSE CIRCUITS; RANDOM PROCESSES; THIN FILMS;

CURRENT-VOLTAGE (I-V); RANDOM VARIATIONS; SWITCHING PARAMETERS;

CHEMICAL COMPOUNDS;

EID: 33750428912     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2353899     Document Type: Article

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