메뉴 건너뛰기




Volumn 911, Issue , 2006, Pages 131-136

Surface morphology and structure of hydrogen etched 3C-SiC(001) on Si(001)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; ETCHING; HYDROGEN; LOW ENERGY ELECTRON DIFFRACTION; SCANNING ELECTRON MICROSCOPY; SINGLE CRYSTALS; SURFACES;

EID: 33750300478     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-0911-b08-02     Document Type: Conference Paper
Times cited : (4)

References (6)
  • 2
    • 31144462673 scopus 로고    scopus 로고
    • Atomic structure of SiC surfaces
    • eds: W.J. Choyke, H. Matsunami, and G. Pensl, Springer
    • U. Starke: "Atomic structure of SiC surfaces", in Silicon Carbide, Recent Major Advances (eds: W.J. Choyke, H. Matsunami, and G. Pensl, Springer, 2004), p. 281.
    • (2004) Silicon Carbide, Recent Major Advances , pp. 281
    • Starke, U.1
  • 3
    • 28144443999 scopus 로고    scopus 로고
    • High growth rates (>30|j.rn/ri) of 4H-S1C epitaxial layers using a horizontal hot-wall CVD reactor
    • R. L. Myers, Y. Shishkin, O. Kordina, and S.E. Saddow, "High growth rates (>30|j.rn/ri) of 4H-S1C epitaxial layers using a horizontal hot-wall CVD reactor", Journal of Crystal Growth vol. 285/4 (2005) pp. 483-486.
    • (2005) Journal of Crystal Growth , vol.285 , Issue.4 , pp. 483-486
    • Myers, R.L.1    Shishkin, Y.2    Kordina, O.3    Saddow, S.E.4
  • 4
    • 33750364030 scopus 로고
    • The role of excess silicon and in situ ethincg on 4H-SIC and 6H-SiC epitaxial layer morphology
    • A.A. Burk Jr., L.B.Rowland, "The role of excess silicon and in situ ethincg on 4H-SIC and 6H-SiC epitaxial layer morphology", Journal of Crystal Growth 167 (1197). pp. 586595
    • (1197) Journal of Crystal Growth , vol.167 , pp. 586595
    • Burk Jr., A.A.1    Rowland, L.B.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.