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Volumn 1, Issue , 2005, Pages 133-138

Evaluation of on-chip transmission line interconnect using Wire Length Distribution

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER AIDED DESIGN; ELECTRIC LINES; ELECTRIC POWER UTILIZATION;

EID: 33750061123     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1145/1120725.1120789     Document Type: Conference Paper
Times cited : (2)

References (6)
  • 2
    • 3042638267 scopus 로고    scopus 로고
    • High density differential transmission line structure on Si USLI
    • June
    • H. Ito, K. Nakarnura, K. Okada and K. Masu, "High Density Differential Transmission Line Structure on Si USLI", IEICE Transactions on Electronics, Vol. E87-C, No. 6, pp. "942-948, June 2004.
    • (2004) IEICE Transactions on Electronics , vol.E87-C , Issue.6 , pp. 942-948
    • Ito, H.1    Nakarnura, K.2    Okada, K.3    Masu, K.4
  • 3
    • 0032026510 scopus 로고    scopus 로고
    • A stochastic wire length distribution for gigascale integration (GSI): Part I: Derivation and validation
    • J. A. Davis, V. K. De, and J. D. Meindl, "A Stochastic Wire Length Distribution for Gigascale Integration (GSI): Part I: Derivation and Validation," IEEE Trans, on Electron Devices, Vol. 45, No.'3, pp. 580-589, 1998.
    • (1998) IEEE Trans, on Electron Devices , vol.45 , Issue.3 , pp. 580-589
    • Davis, J.A.1    De, V.K.2    Meindl, J.D.3
  • 5
    • 0033699979 scopus 로고    scopus 로고
    • Ari empirical three-dimensional crossover capacitance model for multilevel interconnect VLSI circuits
    • May
    • S. Wong, T. G. Lee, D. Ma, and C. Chao, "Ari Empirical Three-Dimensional Crossover Capacitance Model for Multilevel Interconnect VLSI Circuits," IEEE Trans. Semiconductor Manufacturing, vol.13, no. 2, pp. 219-227,May 2000.
    • (2000) IEEE Trans. Semiconductor Manufacturing , vol.13 , Issue.2 , pp. 219-227
    • Wong, S.1    Lee, T.G.2    Ma, D.3    Chao, C.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.