Depth-resolved composition and chemistry of ultra-thin films by angle-resolved X-ray photoelectron spectroscopy

AIP Conference Proceedings

Volumn 788, Issue , 2005, Pages 307-313

  Brundle, C R ^a   Conti, G ^b   Graoui, H ^b   Foad, M ^b   Hung, S ^b   Wang, C ^b   Uritsky, Y S ^b   MacK, P ^c   Wolstenholme, J ^c  

^a C R Brundle and Associates   (United States)

^b APPLIED MATERIALS INC   (United States)

^c Thermo Fisher Scientific   (United States)

Author keywords

Analysis; Arsenic implant; ARXPS; Depth profile; MEIS; Silicon oxynitride; Thin films; XPS

Indexed keywords

EID: 33749658371     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2062980     Document Type: Conference Paper

References (7)

1. See www.thermo.com/surfaceanalysis
2. Chang, P., Opila, R., et al, J Appl. Phys. 87, 4449, (2000)
3. Watts, J., and Wolstenholme, J., An Introduction to Surface Analysis by XPS and AES, Chichester, John Wiley and Sons Ltd., 2003.
4. Douglas, M., J. Electrochem. Soc. 147, 1893, (2000)
5. Brundle, C. R., Mack, P., and Conti, G., to be published.
6. Kouzminov, D., to be published.
7. Van den Berg, J., to be published