Nanoscale structure fabrication of multiple AlGaSb/InGaSb quantum wells by reactive ion etching with chlorine-based gases toward photonic crystals

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 5, 2006, Pages 2291-2294

  Gozu, Shin Ichiro ^a   Akahane, Kouichi ^a   Yamamoto, Naokatsu ^a   Ueta, Akio ^a   Ohtani, Naoki ^b   Tsuchiya, Masahiro ^a  

^a NATIONAL INSTITUTE OF INFORMATION AND COMMUNICATIONS TECHNOLOGY   (Japan)

^b DOSHISHA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; OPTICAL DEVICES; PHOTOLUMINESCENCE; REACTIVE ION ETCHING; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING INDIUM COMPOUNDS;

CHLORINE-BASED GASES; PHOTONIC CRYSTALS; SIMPLE RESIST MASKS;

SEMICONDUCTOR QUANTUM WELLS;

EID: 33749359448     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2348727     Document Type: Article

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