SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 303-309

Characterization of WC-CrAlN heterostructures obtained using a cathodic arc ion plating process

(4) Lee, Ho Y a Han, Jeon G a Baeg, Seung H b Yang, Se H b

a Sungkyunkwan University (South Korea)

b Korea Institute of Industrial Technology (South Korea)

Author keywords

Buffer layer; Heterostructure; WC CrAlN

Indexed keywords

ADHESION; ELECTRON DIFFRACTION; MICROHARDNESS; NANOSTRUCTURED MATERIALS; RESIDUAL STRESSES; SEMICONDUCTING FILMS; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN CARBIDE; X RAY DIFFRACTION ANALYSIS;

NANO-LAYERED STRUCTURES;

HETEROJUNCTIONS;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 18344399594 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(03)00352-9 Document Type: Article

Times cited : (10)

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