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Volumn 18, Issue 4 II, 2000, Pages 1590-1594
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Low-temperature growth of Ti(C,N) thin films on D2 steel and Si(100) substrates by plasma-enhanced metalorganic chemical vapor deposition
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Author keywords
[No Author keywords available]
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Indexed keywords
FILM GROWTH;
IONIZATION OF SOLIDS;
LOW TEMPERATURE PHENOMENA;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
POLYCRYSTALLINE MATERIALS;
SEMICONDUCTING SILICON;
STEEL;
THIN FILMS;
TITANIUM CARBIDE;
TITANIUM NITRIDE;
TETRAKIS DIETHYLAMIDOTITANIUM;
TITANIUM ISOPROPOXIDE;
CERAMIC COATINGS;
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EID: 0034230218
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.582390 Document Type: Article |
Times cited : (5)
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References (14)
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