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Volumn 18, Issue 4 II, 2000, Pages 1590-1594

Low-temperature growth of Ti(C,N) thin films on D2 steel and Si(100) substrates by plasma-enhanced metalorganic chemical vapor deposition

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; IONIZATION OF SOLIDS; LOW TEMPERATURE PHENOMENA; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; STEEL; THIN FILMS; TITANIUM CARBIDE; TITANIUM NITRIDE;

EID: 0034230218     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582390     Document Type: Article
Times cited : (5)

References (14)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.