Epitaxial growth of Er, Ti doped LiNbO3 films prepared by sol-gel method

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 9 B, 2006, Pages 7305-7310

  Takahashi, Makoto ^a   Yoshiga, Tsuyoshi ^a   Kajitani, Naofumi ^a   Takeda, Yuki ^a   Sato, Shoji ^a   Wakita, Koichi ^a   Ohnishi, Naoyuki ^a   Hotta, Kazutoshi ^b   Kurachi, Masato ^b  

^a CHUBU UNIVERSITY   (Japan)

^b Yamaju Ceramic Co Ltd   (Japan)

Author keywords

1530 nm emission; Er doping; LiNbO3; Optical waveguide; Sol gel method

Indexed keywords

CONCENTRATION (PROCESS); EPITAXIAL GROWTH; LITHIUM NIOBATE; OPTICAL WAVEGUIDES; RAMAN SPECTROSCOPY; SOL-GELS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

1530 NM EMISSION; ELECTRON BEAM DIFFRACTION; ER DOPING; SOL-GEL METHOD;

THICK FILMS;

EID: 33748998734     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.7305     Document Type: Article

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