Low temperature growth of transparent conducting ZnO films by plasma assisted deposition

Physica Status Solidi (A) Applications and Materials Science

Volumn 203, Issue 11, 2006, Pages 2887-2890

  Nishii, A ^a   Uehara, T ^a   Sakano, T ^a   Nabetani, Y ^a   Akitsu, T ^a   Kato, T ^a   Matsumoto, T ^a   Hagihara, S ^b   Abe, O ^b   Hiraki, S ^c   Fujikawa, Y ^c  

^a UNIVERSITY OF YAMANASHI   (Japan)

^b Yamanashi Prefectural Industrial Technology Center   (Japan)

^c Nakaya Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FILM PROPERTIES; HALL MEASUREMENTS; INFRARED REGION; ZNO FILMS;

DEPOSITION; FILM GROWTH; OPACITY; PLASMA APPLICATIONS; RAMAN SCATTERING; TRANSPARENCY; X RAY DIFFRACTION; ZINC OXIDE;

CONDUCTIVE FILMS;

EID: 33748993686     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200669650     Document Type: Article

References (7)

1. Z. L. Pel, C. Sun, M. H. Tan, J. Q. Xiao, D. H. Guan, R. F. Huang, and L. S. Wen, J. Appl. Phys. 90, 3432 (2001).
2. W. W. Weans, A. Yamada, M. Konagai, and K. Takahashi, Jpn. J. Appl. Phys. 30, L441 (1991).
3. J. N. Zeng, J. K. Low, Z. M. Ren, T. Liew, and Y. F. Lu, Appl. Surf. Sci. 197/198, 362 (2002).
4. H. Agura, A. Suzuki, T. Matsushita, T. Aoki, and M. Okuda, Thin Solid Films 445, 263 (2003).
5. T. Yamamoto, T. Sakemi, K. Awai, and S. Shirakata, Thin Solid Films 451/452, 439 (2004).
6. T. Minami, S. Ida, T. Miyata, and Y. Minamino, Thin Solid Films 445, 268 (2003).
7. T. Matsumoto, K. Nishimura, Y. Nabetani, and T. Kato, phys. stat. sol. (b) 241, 591 (2004).