The analysis of superconducting thin films modified by AFM lithography with a spectroscopic imaging technique

Surface Science

Volumn 600, Issue 18, 2006, Pages 3673-3676

  Kang, Hyeong Gon ^a   Kim, Seong Kyu ^b   Lee, Haeseong ^a  

^a Korea Basic Science Institute (KBSI)   (South Korea)

^b Sungkyunkwan University   (South Korea)

Author keywords

AFM lithography; Raman imaging; Raman spectroscopy; Superconducting flux flow transistor (SFFT); Superconducting thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CRITICAL CURRENTS; FILM GROWTH; FLUORESCENCE; LANTHANUM COMPOUNDS; LITHOGRAPHY; NANOTECHNOLOGY; RAMAN SPECTROSCOPY; TRANSISTORS; YTTRIUM BARIUM COPPER OXIDES;

LASER SYSTEM; RAMAN IMAGING; RAMAN PEAKS; SUPERCONDUCTING FLUX FLOW TRANSISTORS (SFFT);

SUPERCONDUCTING FILMS;

EID: 33748944483     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2006.02.060     Document Type: Article

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