Superconducting flux flow transistor fabricated by an inductively coupled plasma etching technique

Physica C: Superconductivity and its Applications

Volumn 400, Issue 3-4, 2004, Pages 111-116

  Kang, Hyeong Gon ^a   Im, Y H ^b   Ko, Seokcheol ^a   Lim, Sung Hun ^a   Han, B S ^a   Hahn, Y B ^a  

^a Chonbuk National University   (South Korea)

^b RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

I V curves; ICP; SFFT; Transresistance

Indexed keywords

FABRICATION; FLUXES; LANTHANUM COMPOUNDS; MAGNETIC FIELD EFFECTS; PLASMA ETCHING; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SUPERCONDUCTING MATERIALS; THIN FILMS; YTTRIUM COMPOUNDS;

SUPERCONDUCTING FLUX FLOW TRANSISTORS (SFFT);

TRANSISTORS;

EID: 0242411753     PISSN: 09214534     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physc.2003.07.004     Document Type: Article

References (16)

1. Bremer J.W. Superconducting Devices. McGraw-Hill Electronic Science Series. 1962;McGraw-Hill, New York.
2. Sakai S. Phys. Rev. B. 47:1993;9042.
3. Fujil T., Sakuta K., Awaji T., Matsui K.-i., Hirano T., Ogawa Y., Kobayashi T. Jpn. J. Appl. Phys. 31:1992;L612.
4. Berkowitz S.J., Zhang Y.M., Mallison W.H., Char K., Terzioglu E., Beasiey M.R. Appl. Phys. Lett. 59:1996;3257.
5. Hohenwarter G.K.G., Martens J.S., Mcginnis D.P., Beyer J.B., Nordman J.E. IEEE Trans. Magn. 25:1989;954.
6. Martens J.S., Hohenwarter G.K.G., Beyer J.B., Nordman J.E., GinLey D.S. J. Appl. Phys. 65:1989;4057.
7. Martens J.S., Hietala V.M., Zipperian T.E., Ginley D.S., Tigges C.P., Phillips J.M. IEEE Trans. Microwave Theory Tech. 39:1991;2018.
8. Miyahara K., Tsuru K., Kubo S., Suzuki M. IEEE Trans. Appl. Supercond. 5:1995;3381.
9. Shul R.J., Mcclellan G.B., Casainuovo S.A., Rieger D.J. Appl. Phys. Lett. 69:1996;1119. 70 (1991) 7640.
10. Shul R.J., Mcclellan G.B., Casainuovo S.A., Rieger D.J. Appl. Phys. Lett. 69:1996;1119. 70 (1991) 7640.
11. Hahn Y.B., Pearton S.J. Korean J. Chem. Eng. 17:2000;304.
12. Hahn Y.B., Hays D.C., Donovan S.M., Abernathy C.R., Han J., Shul R.J., Cho H., Jung K.B., Pearton S.J. J. Vac. Sci. Technol. A. 17:1999;763.
13. Im Y.H., Kang H.G., Han B.S., Hahn Y.B. Electrochem. Solid State Lett. 4:2001;C77.
14. Bernstein P., Picard C., Pannetier M., Lecoeur Ph., Hamet J.F., Doan T.D., Contour J.P., Drouet M., Regi F.X. J. Appl. Phys. 82:1997;5030.
15. Miyahara K., Kubo S., Suzuki M. J. Appl. Phys. 75:1994;404.
16. Miyahara K., Kubo S., Suzuki M. J. Appl. Phys. 76:1994;4772.