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Growth of (In)AlGaN compound semiconductors and their application to 300-nm-band high-intensity UV-LEDs
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Hirayama H, Aoyagi Y. Growth of (In)AlGaN compound semiconductors and their application to 300-nm-band high-intensity UV-LEDs. Rev Laser Eng 2002;30:308-314. (in Japanese)
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UV intense emission from nitride semiconductors and its application to 300-nm-band emitting devices
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Hirayama H. UV intense emission from nitride semiconductors and its application to 300-nm-band emitting devices. Optronics 2000;10:145-151. (in Japanese)
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Room-temperature intense 320 nm-band UV emission from quaternary InAlGaN-based multi-quantum wells
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Hirayama H, Enomoto Y, Kinoshita A, Hirata A, Aoyagi Y. Room-temperature intense 320 nm-band UV emission from quaternary InAlGaN-based multi-quantum wells. Appl Phys Lett 2002;80:1589-1591.
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Hirayama H, Kinoshita A, Ainoya M, Yanabi T, Yamanaka T, Hirata A, Aoyagi Y. Growth and optical properties of quaternary InAlGaN for 300 nm-band UV emitting devices. Phys Status Solidi A 2001;188:83-89.
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Short wavelength and high efficiency operation of deep UV LED using quaternary InAlGaN
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The Review of Laser Engineering. (in Japanese)
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Hirayama H, Akita K, Kyono T, Nakamura T, Aoyagi Y. Short wavelength and high efficiency operation of deep UV LED using quaternary InAlGaN. The Review of Laser Engineering. Special Issue on Present Status and Future Prospect of Ultraviolet LEDs and LDs Based on Nitride Semiconductors 2004;32:402-409. (in Japanese)
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Preparation of large freestanding GaN substrates by hydride vapor phase epitaxy using GaAs as a starting substrate
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