Comparison of their electrical, optical, and electrochemical properties of as-grown plasma polymerized organic thin films by PECVD

Thin Solid Films

Volumn 515, Issue 2 SPEC. ISS., 2006, Pages 407-410

  Bae, I S ^a   Jung, C K ^a   Jeong, S H ^a   Cho, S J ^a   Yu, Y J ^a   Kim, J G ^a   Boo, J H ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Corrosion protection efficiency; Organic thiophene and toluene thin films; PACVD

Indexed keywords

CORROSION PROTECTION; ELECTROPOLYMERIZATION; FILM GROWTH; MICROELECTRONICS; OPTICAL PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THERMAL EFFECTS; TOLUENE;

AS GROWN THIN FILMS; CORROSION PROTECTION EFFICIENCY; ORGANIC THIOPHENE AND TOLUENE THIN FILMS; PLASMA POLYMERIZED ORGANIC THIN FILMS;

THIN FILMS;

EID: 33748751579     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.12.175     Document Type: Article

References (9)

1. Peters L. Semicond. Int. 69 (1998) 21
2. Takeishi S., Kudo H., Shinohara R., Hoshino M., Fukuyama S., Yamaguchi J., and Yamada M. J. Electrochem. Soc. 144 5 (1997) 1797
3. Du M., Opila R.L., Donnelly V.M., Sapjeta J., and Boone T. J. Appl. Phys. 85 3 (1999) 1496
4. Ting C.H., and Seidel. In: Lu T.-M., Murarka S.P., Kuan T.-S., and Ting C.H. (Eds). Low-dielectric Constant Materrials-Synthesis and Application in Microelectronics, 17-19 April 1995. Mater. Res. Soc. Proc. vol. 3 (1995) 381 San Francisco, USA
5. Joo J., Quan Y.C., and Jung D. J. Mater. Res. 15 (2000) 229
6. Endo K., Shinoda K., and Tatsumi T. J. Appl. Phys. 86 (2000) 2793
7. Fujii T., Hiramatsu M., and Nawata M. Thin Solid Films 343 (1999) 457
8. Kim K.J., Lee N.-E., Kim M.C., and Boo J.-H. Thin Solid Films 657 (2001) 398
9. Kim M.C., Cho S.H., Han J.G., Hong B.Y., Kim Y.J., Yang S.H., and Boo J.-H. Surf. Coat. Technol. 595 (2003) 169