Infra red quantum dot photolithography

Journal of Sol-Gel Science and Technology

Volumn 40, Issue 1, 2006, Pages 101-107

  Gadipalli, R R ^a   Martin, L A ^a   Heckman, B ^a   Story, J G ^a   Bertino, M F ^a   Fraundorf, P ^b   Guha, S ^c   Leventis, N ^a  

^a MISSOURI UNIVERSITY OF SCIENCE AND TECHNOLOGY   (United States)

^b UNIVERSITY OF MISSOURI ST LOUIS   (United States)

^c UNIVERSITY OF MISSOURI   (United States)

Author keywords

Photolithography; Quantum dots; Semiconductor nanoparticle

Indexed keywords

CATALYST ACTIVITY; HYDROGELS; PHOTOLITHOGRAPHY; SEMICONDUCTING CADMIUM COMPOUNDS; SILICA; SOLUTIONS; SPIN COATING; SUBSTRATES;

CAPPING AGENTS; INFRARED BEAMS; SEMICONDUCTOR NANOPARTICLES; THIOUREA;

SEMICONDUCTOR QUANTUM DOTS;

EID: 33748569157     PISSN: 09280707     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10971-006-9120-1     Document Type: Article

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