Microzone plates with high-aspect ratio fabricated by e-beam and x-ray lithography

Journal of Microlithography, Microfabrication and Microsystems

Volumn 5, Issue 1, 2006, Pages

  Wang, Deqiang ^a   Cao, Leifeng ^b   Xie, Chang Qing ^a   Liu, Ming ^a   Ye, Tian Chun ^a  

^a INSTITUTE OF MICROELECTRONICS   (China)

^b RESEARCH CENTER OF LASER FUSION   (China)

Author keywords

e beam; Micro optics; Microzone plates; X ray lithography; Zone plates

Indexed keywords

ASPECT RATIO; MICROOPTICS; NANOTECHNOLOGY; SILICON NITRIDE; X RAY LITHOGRAPHY;

MICROZONE PLATES (MZP); SILICON NITRIDE FILMS; ZONE PLATES;

ELECTRON BEAM LITHOGRAPHY;

EID: 33748552977     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2170110     Document Type: Article

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