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Volumn 27, Issue 9, 2006, Pages 772-774

RF split capacitance-voltage measurements of short-channel and leaky MOSFET devices

Author keywords

Capacitance measurement; MOSFET; RF; Ultrathin gate dielectric

Indexed keywords

CAPACITANCE MEASUREMENT; GATES (TRANSISTOR); LEAKAGE CURRENTS; RADIOFREQUENCY SPECTROSCOPY; VOLTAGE MEASUREMENT;

EID: 33748514573     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2006.881089     Document Type: Article
Times cited : (22)

References (8)
  • 1
    • 0020186076 scopus 로고
    • "Charge accumulation and mobility in thin dielectric MOS transistors"
    • Sep
    • C. G. Sodini, T. W. Ekstedt, and J. L. Moll, "Charge accumulation and mobility in thin dielectric MOS transistors," Solid State Electron., vol. 25, no. 9, pp. 833-841, Sep. 1982.
    • (1982) Solid State Electron. , vol.25 , Issue.9 , pp. 833-841
    • Sodini, C.G.1    Ekstedt, T.W.2    Moll, J.L.3
  • 2
    • 32444447598 scopus 로고    scopus 로고
    • "Experimental evidence of inversion-layer mobility lowering in ultrathin gate oxide metal-oxide-semiconductor field-effect-transistors with direct tunneling current"
    • Apr
    • S.-I. Takagi and M. Takayanagi, "Experimental evidence of inversion-layer mobility lowering in ultrathin gate oxide metal-oxide-semiconductor field-effect-transistors with direct tunneling current," Jpn. J. Appl. Phys, vol. 41, no. 4B, pp. 2348-2352, Apr. 2002.
    • (2002) Jpn. J. Appl. Phys , vol.41 , Issue.4 B , pp. 2348-2352
    • Takagi, S.-I.1    Takayanagi, M.2
  • 3
    • 3943106832 scopus 로고    scopus 로고
    • "Improved split C-V method for effective mobility extraction in sub-0.1-μm Si MOSFETs"
    • Aug
    • K. Romanjek, F. Andrieu, T. Ernst, and G. Ghibaudo, "Improved split C-V method for effective mobility extraction in sub-0.1-μm Si MOSFETs," IEEE Electron Device Lett., vol. 25, no. 8, pp. 583-585, Aug. 2004.
    • (2004) IEEE Electron Device Lett. , vol.25 , Issue.8 , pp. 583-585
    • Romanjek, K.1    Andrieu, F.2    Ernst, T.3    Ghibaudo, G.4
  • 6
    • 33748487916 scopus 로고    scopus 로고
    • 12 PMOS): Manufacturability, reliability & process window improvement by sacrificial SiGe cap"
    • Honolulu, HI
    • 12 PMOS): Manufacturability, reliability & process window improvement by sacrificial SiGe cap," in VLSI Symp. Tech. Dig., Honolulu, HI, pp. 116-117.
    • VLSI Symp. Tech. Dig. , pp. 116-117
    • Veloso, A.1
  • 8
    • 0036889837 scopus 로고    scopus 로고
    • "A simple efficient model of parasitic capacitances of deep-submicron LDD MOSFETs"
    • Dec
    • F. Prégaldiny, C. Lallement, and D. Mathiot, "A simple efficient model of parasitic capacitances of deep-submicron LDD MOSFETs," Solid State Electron, vol. 46, no. 12, pp. 2191-2198, Dec. 2002.
    • (2002) Solid State Electron , vol.46 , Issue.12 , pp. 2191-2198
    • Prégaldiny, F.1    Lallement, C.2    Mathiot, D.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.