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Applied Physics Letters

Volumn 89, Issue 10, 2006, Pages

Critical nickel thickness to form silicide transrotational structures on [001] silicon

(4) Alberti, Alessandra a Bongiorno, Corrado a Rimini, Emanuele a Grimaldi, Maria Grazia b,c

a CNR (Italy)

b UNIVERSITY OF CATANIA (Italy)

c INFM (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DIFFUSION; GRAIN GROWTH; INTERFACES (MATERIALS); MORPHOLOGY; NICKEL; NUCLEATION; PHASE TRANSITIONS; POLYCRYSTALLINE MATERIALS; SILICON; SPUTTERING;

POLY-STRUCTURES; REACTION TEMPERATURE; SILICIDE; TRANSROTATIONAL STRUCTURES;

CRYSTALLINE MATERIALS;

EID: 33748488260 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.2338019 Document Type: Article

Times cited : (22)

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