Electrodeposition behavior of nanocrystalline CoNiFe soft magnetic thin film

Transactions of Nonferrous Metals Society of China (English Edition)

Volumn 16, Issue 3, 2006, Pages 659-665

  Li, Jin Feng ^a,b   Zhang, Zhao ^b   Yin, Jun Ying ^b   Yu, Geng Hua ^b   Cai, Chao ^c   Zhang, Jian Qing ^b  

^a CENTRAL SOUTH UNIVERSITY   (China)

^b ZHEJIANG UNIVERSITY   (China)

^c NINGXIA UNIVERSITY   (China)

Author keywords

Anomalous co deposition; Electrocrystallization mechanism; Nanocrystalline CoNiFe film; Pulse reverse electroplating; Soft magnetism

Indexed keywords

COBALT ALLOYS; COERCIVE FORCE; CRYSTALLINE MATERIALS; CURRENT DENSITY; CYCLIC VOLTAMMETRY; ELECTRODEPOSITION; IRON ALLOYS; MAGNETIC THIN FILMS; NANOSTRUCTURED MATERIALS; NICKEL ALLOYS;

ANOMALOUS CODEPOSITION; COBALT NICKEL IRON; ELECTROCRYSTALLIZATION MECHANISM; NANOCRYSTALLINE FILM; PULSE REVERSE ELECTROPLATING;

SOFT MAGNETIC MATERIALS;

EID: 33748468401     PISSN: 10036326     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1003-6326(06)60117-9     Document Type: Article

References (42)

1. OSAKA T, TAKAI M, HAYASHI K, OHASHI K, SAITO M, YAMADA K. A soft magnetic CoNiFe film with high saturation magnetic flux density and low coercivity[J]. Nature, 1998, 392: 796-798.
2. BAI A, HU C C. Effects of electroplating variables on the composition and morphology of nickel-cobalt deposits plated through means of cyclic voltammetry[J]. Electrochim Acta, 2002, 47: 3447-3456.
3. OSAKA T. Introduction of electrochemical microsystem technologies (EMT) from ultra-high-density magnetic recording[J]. Electrochim Acta, 2001, 47: 23-28.
4. NAKANISHI T, OZAKI M, NAM H S, YOKOSHMA T, OSAKA T. Pulsed electrodeposition of nanocrystalline CoNiFe soft magnetic thin films[J]. J Electrochem Soc, 2001, 148(9): C627-C631.
5. PETERSSON I, AHLBERG E. Kinetics of the electrodeposition of Pb circle divide Sn alloys (Part I): at glassy carbon electrodes[J]. J Electroanal Chem, 2000, 485: 166-177.
6. MARGARITA M H, MANUEL P P, NIKOLA B, IGNACIO G. Identification of different silver nucleation processes on vitreous carbon surfaces from an ammonia electrolytic bath[J]. J Electroanal Chem, 1998, 443: 81-93.
7. MARGARITA M H, MANUEL P P, NIKOLA B, IGNACIO G. Detailed characterization of potentiostatic current transients with 2D-2D and 2D-3D nucleation transitions[J]. Surf Sci, 1998, 399: 80-95.
8. HOLZLE M H, RETTER U, KOLB D M. The kinetics of structural changes in Cu adlayers on Au (111)[J]. J Electroanal Chem, 1994, 371: 101-109.
9. ENRIQUE B, MANUEL P P, NIKOLA B, IGNACIO G. Formation mechanisms and characterization of black and white cobalt electrodeposition onto stainless steel[J]. J Electrochem Soc, 2000, 147(5): 1787-1796.
10. MANUEL P P, MA T R, IGNACIO G. New insights into evaluation of kinetic parameters for potentiostatic metal deposition with underpotential and overpotential deposition processes[J]. J Electrochem Soc, 1996, 143(5): 1551-1546.
11. GUNAWARDENA G, HILLS G, MONTENEGRO I, SCHARIFKER B. Electrochemical nucleation (Part I): General considerations[J]. J Electroanal Chem, 1982, 138: 225-239.
12. HILLS G J, SCHIFFRIN D J, THOMPSON J. Electrochemical nucleation from molten salts (I): Diffusion controlled electrodeposition of silver from alkali molten nitrates[J]. Electrochim Acta, 1974, 19: 657-670.
13. GUNAWARDENA G, HILLS G, MONTENEGRO I, SCHARIFKER B. Electrochemical nucleation (Part III): The electrodeposition of mercury on vitreous carbon[J]. J Electroanal Chem, 1982, 138: 255-271.
14. SCHARIFKER B, HILLS G. Theoretical and experimental studies of multiple nucleation[J]. Electrochim Acta, 1981, 28: 879-889.
15. SCHARIFKER B, MOSTANY J. Three-dimensional nucleation with diffusion controlled growth (Part I): Number density of active sites and nucleation rates per site[J]. J Electroanal Chem, 1984, 177: 13-23.
16. DEUTSSCHER R L, FLETCHER S. Nucleation on active sites (Part IV): Invention of an electronic method of counting the number of crystals as a function of time; and the discovery of nucleation rate dispersion[J]. J Electroanal Chem, 1998, 239: 17-54.
17. DEUTSSCHER R L, FLETCHER S. Nucleation on active sites (Part V): The theory of nucleation rate dispersion[J]. J Electroanal Chem, 1990, 277: 1-18.
18. FLETCHER S, HALLIDAY C S, GATES D, WESTCOTT M, WIN T L, NELSON G. The response of some nucleation/growth processes to triangular scans of potential[J]. J Electroanal Chem, 1983, 159: 267-285.
19. FLETCHER S. Nucleation on active sites (Part II): Probabilistic formulae for electrical currents[J]. J Electroanal Chem, 1984, 164: 11-16.
20. DEUTSSCHER R L, FLETCHER S. Nucleation on active sites (Part I): Probabilistic formulae for the numbers of crystals[J]. J Electroanal Chem, 1984, 164: 1-9.
21. TADANNO A, ASANUMA M, AOGAKI R. Electrochemical nucleation induced by nonequilibrium fluctuations[J]. J Crystal Growth, 1996, 166: 1111-1115.
22. ABYANEH M Y. Extracting nucleation rates from current-time transients (Part I): The choice of growth models[J]. J Electroanal Chem, 2002, 530: 82-88.
23. ABYANEH M Y, FLEISCHMANN M. Extracting nucleation rates from current-time transients (Part II): Comparing the computer-fit and pre-pulse method[J]. J Electroanal Chem, 2002, 530: 89-95.
24. ABYANEH M Y. Extracting nucleation rates from current-time transients (Part III): Nucleation kinetics following the application of a pre-pulse[J]. J Electroanal Chem, 2002, 530: 96-104.
25. AVRAMI M. Kinetics of phase change (I): General theory[J]. J Chem Phys, 1939, 7: 1103-1112.
26. AVRAMI M. Kinetics of phase change (II): Transformation-time relations for distribution of nuclei[J]. J Chem Phys, 1940, 8: 212-224.
27. AVRAMI M. Kinetics of phase change (III): Granulation and phase change and microstructure[J]. J Chem Phys, 1941, 9: 177-184.
28. AOGAKI R. Instability of nonequilibrium fluctuation in electrochemical nucleation (I): Occurrence of instability[J]. J Chem Phys, 1995, 103(9): 8602-8615.
29. MANUEL P P, IGNACIO G, NIKOLA B. New insights into evaluation of kinetic parameters for potentiostic metal deposition with underpotential and overpotential deposition process[J]. J Chem Phys B, 2000, 104: 3545-3555.
30. TSAY P, HU C C. Non-anomalous codeposition of iron-nickel alloys using pulse-reverse electroplating through means of experimental strategies[J]. J Electrochem Soc, 2002, 149: C492-C497.
31. ZHANG Z, ZHANG J Q, LENG W H, CAO C N. Cooperation behavior of iron and phosphorus in electrodeposition of zinc-iron-phosphorus coatings[J]. Mater Chem Phys, 2002, 77: 497-500.
32. LIOU C K. Inorganic Chemistry (vol. I)[M]. Changsha: Central South University of Technology Press, 1994. 182.
33. FRISCH M J, TRUCKS G W, SCHLEGEL H B. et al. Gaussian 94 (Revision E.1)[M]. Pittsburgh PA: Gaussian Inc, 1995.
34. JIANG Y S. The Structure Chemistry[M]. Beijing: High Education Press, 1997. 197-202.
35. JAYA S, PRASADA R T, PRABHAKARA R G. Electrochemical phase formation (I): The electrodeposition of copper on glassy carbon[J]. Electrochim Acta, 1986, 31(3): 343-348.
36. SCHINDLER W, HUGELMANN P, HUGELMANN M, KARTNER F X. Localized electrochemical nucleation and growth of low-dimensional metal structures[J]. J Electroanal Chem, 2002, 522: 49-57.
37. AFSHR A, DOLATI A G, GHORBANI M. Electrochemical characterization of the Ni-Fe alloy electrodeposition from chloride-citrate-glycolic acid solution[J]. Mater Chem Phys, 2002, 77: 352-358.
38. YANG Z N, ZHANG Z, ZHANG J Q. Electrodeposition of decorative and protective Zn-Fe coating onto low-carbon steel substrate[J]. Surf Coat Technol, 2006, 200(16-17): 4810-4815.
39. ZHANG Z, LENG W H, SHAO H B, ZHANG J Q, WANG J M, CAO C N. Study the behavior of Zn-Fe alloy electroplating[J]. J Electroanal Chem, 2001, 516: 127-130.
40. STOYCHEV D, PAPOUTSIS A, KELAIDOPOULOU A, KOKKINIDIS G, MILCHEV A. Electrodeposition of platinum on metallic and nonmetallic substrates-selection of experimental conditions[J]. Mater Chem Phys, 2001, 72: 360-365.
41. KELAIDOPOULOU A, KOKKINIDIS G, MILCHEV A. Nucleation and growth of metal catalysts (Part I): Electrodeposition of platinum on tungsten[J]. J Electroanal Chem, 1998, 444: 195-201.
42. MILCHEV A, STOYCHEV D, LAZAROV V, PAPOUTSIS A, KOKKINIDIS G. Electrocrystallisation of metal catalysts: nucleation and growth of platinum on a titanium electrode[J]. Journal of Crystal Growth, 2001, 226(1): 138-147.