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Semiconductor International
Volumn 29, Issue 9, 2006, Pages 40-46
Nanojmprint lithography: A contender for 32 nm?
[No Author Info available]
Author keywords

[No Author keywords available]
Indexed keywords

DIELECTRIC MATERIALS; MACROMOLECULES; OPTICAL INTERCONNECTS; PHOTOLITHOGRAPHY; SURFACE TOPOGRAPHY;
EID: 33748466134     PISSN: 01633767     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article
Times cited : (1)
References (4)
  • 1
    • 33748459828 scopus 로고    scopus 로고
    • Nano-iniprint makes its mark
    • July
    • R. Arensman, "Nano-iniprint Makes Its Mark," Electronic Business, July 2005.
    • (2005) Electronic Business
    • Arensman, R.1
  • 2
    • 10844291014 scopus 로고    scopus 로고
    • Polymer imprint lithography with molecular-scale resolution
    • December
    • F. Hua et al., "Polymer Imprint Lithography with Molecular-Scale Resolution" Nano letters, December 2004
    • (2004) Nano Letters
    • Hua, F.1
  • 3
    • 84888356564 scopus 로고    scopus 로고
    • Interconnect patterning in a single step with multi-level nanoimprint lithography
    • October
    • M. Stewart et al., "Interconnect Patterning in a Single Step with Multi-level Nanoimprint Lithography," VLSI Multilevel Interconnect Conf. (VMIC), October 2005.
    • (2005) VLSI Multilevel Interconnect Conf. (VMIC)
    • Stewart, M.1
  • 4
    • 4544276500 scopus 로고    scopus 로고
    • One on one: A closer look at nanoimprinting
    • September
    • A. Hand, "One on One: A Closer Look at Nanoimprinting," Semiconductor International, September 2004, p. 40.
    • (2004) Semiconductor International , pp. 40
    • Hand, A.1

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.