Quantitative hydrogen measurements in PECVD and HWCVD a-Si:H using FTIR spectroscopy

Journal of Materials Science

Volumn 41, Issue 16, 2006, Pages 5287-5291

  Goldie, D M ^a   Persheyev, S K ^a  

^a UNIVERSITY OF DUNDEE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS; TUNGSTEN; WIRE;

DATASETS; HOT-WIRE CHEMICAL VAPOR DEPOSITION (HWCVD); HYDROGENATED AMORPHOUS SILICON FILMS; TUNGSTEN WIRES;

HYDROGEN;

EID: 33748354487     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/s10853-006-0302-6     Document Type: Conference Paper

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