Coupling of a vacuum-ultraviolet-radiation source to a processing system

Journal of Applied Physics

Volumn 100, Issue 4, 2006, Pages

  Chatterton, J D ^a   Upadhyaya, G S ^a   Shohet, J L ^a   Lauer, J L ^a   Bathke, R D ^a   Kukkady, K ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPILLARY ARRAY; DIELECTRIC SURFACE; ELECTRON CYCLOTRON RESONANCE PLASMA; KELVIN PROBE;

PHOTOEMISSION; PLASMAS; SILICON WAFERS; SPECTRUM ANALYSIS; ULTRAVIOLET RADIATION; VACUUM APPLICATIONS;

ELECTRON CYCLOTRON RESONANCE;

EID: 33748314845     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2335688     Document Type: Article

References (8)

1. M. Armacost et al. IBM J. Res. Dev. 43, 39 (1999).
2. C. Cismaru, J. L. Shohet, J. L. Shohet, R. W. Hansen, and S. Ostapenko, Appl. Phys. Lett. 77, 3914 (2000).
3. T. Lucatorto B, T. J. Mcllrath, and J. R. Roberts, Appl. Opt. 18, 2505 (1979).
4. B. Mercier, M. Compin, C. Prevost, G. Bellec, R. Thissen, O. Dutuit, and L. Nahon, J. Vac. Sci. Technol. A 18, 2533 (2000).
5. C. M. Van Atta, Vacuum Science and Engineering (McGraw-Hill, New York, 1965), p. 34.
6. R. Vest (private communication).
7. A. Hoff, K. Nauka, T. Persoon, J. Lagowski, L. Jastrzebski, and P. Edelman, Proceedings of the IEEE/SEMI Advanced Semiconductor Manufacturing Conference (1997), p. 185.
8. W. A. Zisman, Rev. Sci. Instrum. 3, 367 (1932).