Depletion of charge produced during plasma exposure in aluminum oxide by vacuum ultraviolet radiation

Applied Physics Letters

Volumn 77, Issue 24, 2000, Pages 3914-3916

  Cismaru, C ^a,c   Shohet, J L ^a   Lauer, J L ^a   Hansen, R W ^a,d   Ostapenko, S ^b  

^a University of Wisconsin Madison   (United States)

^b UNIVERSITY OF SOUTH FLORIDA   (United States)

^c Rockwell Semiconductor Systems   (United States)

^d UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0003540964     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1331081     Document Type: Article

References (11)

1. R. A. Gdula, IEEE Trans. Electron Devices 26, 644 (1979).
2. T. Yunogami, T. Mizutani, K. Suzuki, and S. Nishimatsu, Jpn. J. Appl. Phys., Part 1 28, 2172 (1989).
3. T. Mizutani, in International Symposium on Plasma Process-Induced Damage, edited by K. P. Cheung, M. Nakamura, and C. T. Gabriel (NCCAVS, Sunnyvale, CA, 1996), p. 157.
4. C. Cismaru and J. L. Shohet, Appl. Phys. Lett. 74, 2599 (1999).
5. S. A. Bell and D. W. Hess, J. Electrochem. Soc. 139, 2904 (1992).
6. A. W. Flounders, S. A. Bell, and D. W. Hess, J. Electrochem. Soc. 140, 1414 (1993).
7. K. Hashimoto, Jpn. J. Appl. Phys., Part 1 32, 6109 (1993).
8. C. Cismaru, J. L. Shohet, and J. P. McVittie, Appl. Phys. Lett. 76, 2191 (2000).
9. P. Edelman, A. M. Hoff, L. Jastrzebski, and J. Lagowski, Proc. SPIE 2337, 154 (1994).
10. W. A. Zistnan, Rev. Sci. Instrum. 3, 367 (1932).
11. C. Cismaru and J. L. Shohet, J. Appl. Phys. 88, 1742 (2000)