Self-assembled monolayers of isocyanides on nickel electrodes

Angewandte Chemie - International Edition

Volumn 44, Issue 27, 2005, Pages 4228-4231

  Lee, Youngu ^a   Morales, Gustavo M ^a   Yu, Luping ^a  

^a UNIVERSITY OF CHICAGO   (United States)

Author keywords

Chemisorption; Molecular devices; Monolayers nickel; Self assembly

Indexed keywords

CHEMISORPTION; CYANIDES; ETHANOL; GOLD; MONOLAYERS; NICKEL; SELF ASSEMBLY; THERMODYNAMIC STABILITY;

ISOCYANIDES; MOLECULAR ELECTRONICS; THIOL MONOLAYERS;

ELECTRODES;

EID: 22144434439     PISSN: 14337851     EISSN: None     Source Type: Journal    
DOI: 10.1002/anie.200500942     Document Type: Article

References (28)

1. a) Thin Films: Self-Assembled Monolayers of Thiols (Ed.: A. Ulman), Academic Press. San Diego, 1998;
2. b) Y. Xia, G. M. Whitesides, Angew. Chem. 1998, 110, 568-594;
3. Angew. Chem. Int. Ed. 1998, 37, 550-575.
4. S. Datta, W. Tian, S. Hong, R. Reifenberger, J. I. Henderson, C. P. Kubiak, Phys. Rev. Lett. 1997, 79, 2530-2533.
5. J. M. Seminario, C. E. De La Cruz, P. A. Derosa, J. Am. Chem. Soc. 2001, 123, 5616-5617.
6. a) E. Delamarche, B. Michel, H. Kang, C. Gerber, Langmuir 1994, 10, 4103-4108;
7. b) J. B. Schienoff, M. Li, H. Ly, J. Am. Chem. Soc. 1995, 117, 12528-12536.
8. G. K. Ramachandran, T. J. Hopson, A. M. Rawlett, L. A. Nagahara, A. Primak, S. M. Lindsay, Science 2003, 300, 1413-1416.
9. N. B. Zhitenev, A. Erbe, Z. Bao, Phys. Rev. Lett. 2004, 92, 186805.
10. a) Z. H. Xiong, D. Wu, Z. Valy Vardeny, J. Shi. Nature 2004, 427, 821-824.
11. a) Z. Mekhalif, F. Laffineur, N. Couturier, J. Delhalle, Langmuir 2003, 19, 637-645;
12. b) S. M. Kane, D. R. Huntley, J. L. Gland, J. Phys. Chem. B 2001, 105, 9548-9556:
13. c) S. M. Kane, J. L. Gland, Surf. Sci. 2000, 468, 101-108;
14. d) Z. Mekhalif, A. Lazarescu, L. Hevesi, J.-J. Pireaux, J. Delhalle, J. Mater. Chem. 1998, 8, 545-551.
15. a) K. L. Murphy, W. T. Tysoe, D. W. Bennett, Langmuir 2004, 20, 1732-1738;
16. b) J. I. Henderson, S. Feng, T. Bein, C. P. Kubiak, Langmuir 2000, 16, 6183-6187;
17. c) A. C. Ontko, R. J. Angelici, Langmuir 1998, 14, 3071-3078.
18. a) D. Bong, I. Tam, R. Breslow, J. Am. Chem. Soc. 2004, 126, 11796-11797;
19. b) M. Geissler, J. Chen, Y. Xia, Langmuir 2004, 20, 6993-6997.
20. K. Murphy, S. Azad, D. W. Bennett, W. T. Tysoe, Surf. Sci. 2000, 467, 1-9.
21. H. S. Han, S. W. Han, S. W. Joo, K. Kim. Langmuir 1999, 15, 6868-6874.
22. O. Clot, M. O. Wolf, Langmuir 1999, 15, 8549-8551.
23. a) C. M. Friend, J. Stein, E. L. Muetterties, J. Am. Chem. Soc. 1981, 103, 767-772;
24. b) C. M. Friend, E. L. Muetterties, J. Gland, J. Phys. Chem. 1981, 85, 3256-3262.
25. H. O. Finklea, Electroanalytical Chemistry, Vol. 19 (Eds.: A. J. Bard, I. Rubinstein), Marcel Dekker, New York, 1998.
26. A. J. Bard, R. Faulkner, Electrochemical Methods, Wiley, New York, 1980.
27. R. G. Greenler, J. Chem. Phys. 1966, 44, 310-315.
28. F. Bensebaa, T. H. Ellis, A. Badia, R. B. Lennox, Langmuir 1998, 14, 2361-2361.