Oxidized titanium as a bottom electrode adhesion layer for the multilayer (Ba,Sr)TiO3 capacitors

Integrated Ferroelectrics

Volumn 45, Issue , 2002, Pages 97-103

  Koutsaroff, I P ^a   Zelner, M ^a   Woo, P ^a   McNeil, L ^a   Buchbinder, M ^a   Cervin Lawry, A ^a  

^a Gennum Corporation   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; CAPACITORS; MAGNETRON SPUTTERING; MULTILAYERS; POROSITY; SILICON COMPOUNDS; SURFACE ROUGHNESS; THERMOOXIDATION; TITANIUM DIOXIDE; X RAY DIFFRACTION;

BOTTOM ELECTRODES; INFRARED IMAGE FURNACES; OPTIMAL CONDITIONS; ULTRA THIN FILMS;

THIN FILMS;

EID: 33747612001     PISSN: 10584587     EISSN: 16078489     Source Type: Conference Proceeding    
DOI: 10.1080/10584580215339     Document Type: Article

References (5)

1. J.M.Bell, P.C. Knight, and G.R.Johnston in: Ferroelectricity and Related Phenomena, vol 10p. 93-134.
2. M.Grossmann et al., Journal of the European Ceramic Society 19 (1999) 1413-1415
3. H.M. Al-Shareef et al. J. Mater. Res., Vol. 12, No2, 1997, pp.347-354
4. W-J Lee and H-J Kim. Integrated Ferroeletrics, Vol.11, pp.111-119
5. S.Y. Kweon and H-G Kim. J. Appl. Physics. Vol.12, No 2, 1997, pp. 347-354.