The development of the complete X-Factor contribution measurement for improving cycle time and cycle time variability

IEEE Transactions on Semiconductor Manufacturing

Volumn 19, Issue 3, 2006, Pages 352-362

  Delp, Deana ^a,b   Si, Jennie ^a,b   Fowler, John W ^b  

^a IEEE   (United States)

^b Arizona State University   (United States)

Author keywords

Capacity analysis; Cycle time variability; X factor

Indexed keywords

CAPACITY ANALYSIS; CYCLE TIME VARIABILITY; PROCESS ROUTING; X-FACTOR;

MACHINE SHOP PRACTICE; MATHEMATICAL MODELS; PRODUCT DEVELOPMENT; QUALITY CONTROL; SEMICONDUCTOR DEVICE MANUFACTURE; WORK-REST SCHEDULES;

PROCESS ENGINEERING;

EID: 33747430874     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2006.879408     Document Type: Article

References (19)

1. J. K. Robinson and F. Chance, "Wafer fab cycle time management using MES data," in Proc. 2000 Modeling Analysis Semiconductor Manufacturing Conf. (MASM 2000), 2000, pp. 183-187.
2. W. J. Hopp and M. L. Spearman, Factory Physics, 2nd ed. New York: Irwin/McGraw-Hill, 2001.
3. E. M. Goldratt and J. Cox, The Goal: A Process of Ongoing Improvement, 2nd ed. Great Barrington, MA: North River, 1992.
4. M. Barney, Motorola's Second Generation [Online], Available: mu.motorola.com
5. S. Li, T. Tang, and D. W. Collins, "Minimum inventory variability schedule with applications in semiconductor fabrication," IEEE Trans. Semiconduct. Manufact., vol. 9, no. 1, pp. 145-149, Feb. 1996.
6. J. H. Jacobs, L. F. P. Etman, E. J. J. van Campen, and J. E. Rooda, "Characterization of operational time variability using effective process times," IEEE Trans. Semiconduct. Manufact., vol. 16, no. 3, pp. 511-520, Aug. 2003.
7. G. D. Taylor and S. S. Heragu, "A comparison of mean reduction versus variance reduction in processing times in flow shops," Int. J. Production Res., vol. 37, no. 9, pp. 1919-1934, 1999.
8. K. Wu, "An examination of variability and its basic properties for a factory," IEEE Trans. Semiconduct. Manufact., vol. 18, no. 1, pp. 214-221, Feb. 2005.
9. A. K. Schoemig, "On the corrupting influence of variability in semiconductor manufacturing," in Proc. 1999 Winter Simulation Conf. (WSC), 1999, pp. 837-842.
10. D. P. Martin, "The advantages of using short cycle time manufacturing (SCM) instead of continuous flow manufacturing (CFM)," in Proc. 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conf. (ASMC), 1998, pp. 43-49.
11. D. Delp, J. Si, Y. Hwang, and B. Pei, "A systematic study of the X-factor in relation to effective system capacity," J. Manufacturing Syst., to be published.
12. _, "A dynamic system regulation measure for increasing effective capacity: The X-factor theory," in Proc. IEEE/SEMI Advanced Semiconductor Manufacturing Conf. Workshop (ASMC), 2003, pp. 81-88.
13. D. P. Martin, "Optimizing manufacturing asset utilization," in Proc. 1996 IEEE/SEMI Advanced Semiconductor Manufacturing Conf. (ASMC), Cambridge, MA, Nov. 12-14, 1996.
14. D. Delp, J. Si, Y. Hwang, B. Pei, and J. Fowler, "Availability adjusted X-factor," Int. J. Production Res., vol. 43, no. 18, pp. 3933-3953, 2005.
15. K. Ozawa, H. Wada, and T. Yamaguchi, "Optimum tool planning using the X-factor theory," in Proc. 1999 IEEE Int. Symp. Semiconductor Manufacturing (ISSM), 1999, pp. 49-52.
16. M. Kishimoto, K. Ozawa, and D. P. Martin, "Optimized operations by extended X-factor theory including unit hours concept," IEEE Trans. Semiconduct. Manufact., vol. 14, no. 3, pp. 187-195, Aug. 2001.
17. D. Delp, "A new X-factor contribution measure for identifying machine level capacity constraints and variability," in Proc. IEEE/SEMI Advanced Semiconductor Manufacturing Conf. Workshop (ASMC), 2004, pp. 334-338.
18. Factory Explorer ver. 2.8, Wright Williams and Kelly [Online]. Available: www.wwk.com
19. J. Fowler, SEMATECH Dataset 1, Modeling and Analysis for Semiconductor Manufacturing Laboratory Web Site. Tempe, AZ: Arizona State Univ. [Online]. Available: www.eas.asu.edu/~masmlab/