Important increase of negative secondary ion sensitivity during SIMS analysis by neutral cesium deposition

Applied Surface Science

Volumn 252, Issue 19, 2006, Pages 7205-7207

  Philipp, P ^a   Wirtz, T ^a   Migeon, H N ^a   Scherrer, H ^b  

^a LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY   (Luxembourg)

^b INSTITUT JEAN LAMOUR   (France)

Author keywords

Cs concentration; Neutral Cs deposition; SIMS; Useful yield; Work function

Indexed keywords

CESIUM; CHEMICAL ANALYSIS; GALLIUM COMPOUNDS; MASS SPECTROMETERS; OPTIMAL SYSTEMS; OPTIMIZATION; SENSITIVITY ANALYSIS;

CS CONCENTRATION; NEUTRAL CS DEPOSITION; USEFUL YIELD; WORK FUNCTION;

SECONDARY ION MASS SPECTROMETRY;

EID: 33747417479     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.02.119     Document Type: Article

References (13)

1. Mootz T., et al. In: Benninghoven A., Bertrand P., Migeon H.-N., and Werner H.W. (Eds). Secondary Ion Mass Spectrometry SIMS XII (2000), Elsevier, Amsterdam 233
2. Philipp P., et al. Appl. Surf. Sci. 231/232 (2004) 754
3. Wirtz T., Migeon H.-N., and Scherrer H. Int. J. Mass Spectrom. 225 (2003) 135
4. Wirtz T., and Migeon H.-N. Surf. Sci. 557 (2004) 57
5. Wirtz T., and Migeon H.-N. Surf. Sci. 561 (2004) 200
6. Wirtz T., and Migeon H.-N. Appl. Surf. Sci. 231/232 (2004) 940
7. Michaelson H.B. J. Appl. Phys. 48 11 (1977) 4729
8. Gerlach R.L., and Rhodin T.N. Surf. Sci. 19 (1970) 403
9. Möller W., and Eckstein W. Nucl. Instrum. Meth. Phys. Res. B 2 (1984) 814
10. Möller W., Eckstein W., and Biersack J.P. Comput. Phys. Commun. 51 (1988) 355
11. Hohlfeld A., Sunjic M., and Horn K. J. Vac. Sci. Technol. A 5 4 (1987) 679
12. Ortega J.E., et al. Phys. Rev. B 36 11 (1987) 6213
13. Cameca, Private commun.