Preparation of new photosensitive TiO2 gel films using chemical additives including nitrogen and their patterning

Journal of Sol-Gel Science and Technology

Volumn 39, Issue 2, 2006, Pages 119-122

  Imao, Tomohiro ^a   Horiuchi, Takashi ^a   Noma, Naoki ^a   Ito, Seishiro ^a  

^a KINKI UNIVERSITY   (Japan)

Author keywords

Ketoamide; Chemical modification; Patterning; Photosensitivity; UV irradiation

Indexed keywords

ABSORPTION; ADDITIVES; CHEMICAL MODIFICATION; IRRADIATION; LEACHING; MERCURY VAPOR LAMPS; NITROGEN COMPOUNDS; PHOTOSENSITIVITY; SOL-GELS; THIN FILMS;

CHELATE RING; GEL FILMS; PATTERNING; UV-IRRADIATION;

TITANIUM OXIDES;

EID: 33747213407     PISSN: 09280707     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10971-006-7286-1     Document Type: Article

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